Chapter 3 . Gas Source Molecular Beam Epitaxy of Compound Semiconductors

نویسنده

  • Irina Mnushkina
چکیده

Current state-of-the-art epitaxial growth techniques employ various metalorganic and hydride gases to deliver constituent species to the substrate surface, particularly high vapor pressure species such as phosphorus and sulfur. Gas source molecular beam epitaxy (GSMBE) utilizes hydride gas sources and solid elemental sources. The more conventional growth approach, molecular beam epitaxy (MBE), uses only molecular beams derived from the thermal evaporation of elemental or compound solid sources.

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تاریخ انتشار 2009